Pupil-Shaping Technique in Extreme Ultraviolet Lithography Illumination System

Xin Wang; Zhongliang Li; Chunxiao Yuan

doi:10.3788/CJL240575

Chinese Journal of Lasers, Volume. 51, Issue 12, 1202412(2024)

Pupil-Shaping Technique in Extreme Ultraviolet Lithography Illumination System

Xin Wang^1,2, Zhongliang Li^1,2、*, and Chunxiao Yuan¹

¹Advanced Light Source and System R&D Center, Department of Advanced Optical and Microelectronic Equipment, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²College of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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Figures & Tables(17)

Fig. 1. Simplified diagram of EUV lithography illumination system

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Fig. 2. Facet arrangement. (a) Field facets; (b) pupil facets

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Fig. 3. Schematic diagram of Kohler illumination system

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Fig. 4. Schematic of double facet mirrors [switching of illumination mode from (a) to (b)]

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Fig. 5. Parameters of illumination mode. (a) Partial coherence factor; (b) inner partial coherence factor and outer partial coherence factor; (c) polar azimuth angle and polar opening angle

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Fig. 6. Seven base illumination modes. (a) Conventional mode; (b) small annular mode; (c) large annular mode; (d) X dipole mode; (e) Y dipole mode; (f) 0° quadrupole mode; (g) 45° quadrupole mode

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Fig. 7. Facet grouping algorithm. (a) Diagram of the pupil facet mirror partition; (b) solution space tree diagram of 2 elements; (c) flow chart

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Fig. 8. Illumination area of pupil facet mirror. (a) Conventional 1; (b) conventional 2; (c) small annular 1; (d) small annular 2; (e) large annular 1; (f) large annular 2; (g) X dipole 1; (h) X dipole 2; (i) Y dipole 1; (j) Y dipole 2; (k) 0° quadrupole 1; (l) 0° quadrupole 2; (m) 45° quadrupole 1; (n) 45° quadrupole 2;

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Fig. 9. Flow chart of IABC

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Fig. 10. Comparison of facet matching optimization algorithms based on IABC, GA , and ACO

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Fig. 11. Layout of the illumination system in LightTools

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Fig. 12. Simulation of pupil conjugate plane. (a) Conventional 1; (b) small annular 1; (c) large annular 1; (d) X dipole 1; (e) Y dipole 1; (f) 0° quadrupole 1; (g) 45° quadrupole 1

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Fig. 13. Illumination area on the mask (conjugate planes) of seven illumination modes. (a) Conventional 1; (b) small annular 1; (c) large annular 1; (d) X dipole 1; (e) Y dipole 1; (f) 0° quadrupole 1; (g) 45° quadrupole 1

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Table 1. Pupil characteristic parameters
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Table 1. Pupil characteristic parameters
Pupil characteristic parameter Equation Regional division
HV ellipticity
ST ellipticity
Pole balance X
Pole balance Y
Pole balance quad 0
Pole balance quad 45

Table 2. Parameters of the fourteen illumination modes

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Table 2. Parameters of the fourteen illumination modes

Illumination mode	$σ_{i n}$	$σ_{o u t}$	φ /（°）	θ /（°）
Conventional 1	0	0.579	‒	‒
Conventional 2	0	0.810	‒	‒
Small annular 1	0.225	0.580	‒	‒
Small annular 2	0.422	0.727	‒	‒
Large annular 1	0.542	0.735	‒	‒
Large annular 2	0.784	0.979	‒	‒
X dipole 1	0.266	0.718	0/180	90
X dipole 2	0.470	0.960	0/180	90
Y dipole 1	0.266	0.718	90/270	90
Y dipole 2	0.470	0.960	90/270	90
0° quadrupole 1	0.266	0.718	0/90/180/270	45
0° quadrupole 2	0.470	0.960	0/90/180/270	45
45° quadrupole 1	0.266	0.718	45/135/225/315	45
45° quadrupole 2	0.470	0.960	45/135/225/315	45

Table 3. Pupil characteristic parameters

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Table 3. Pupil characteristic parameters

Illumination mode	HV ellipticity	ST ellipticity	Pole balance X	Pole balance Y	Pole balance quad 0	Pole balance quad 45
Conventional 1	4.79	‒	0.20	3.81	4.01	‒
Small annular 1	2.46	‒	0.20	3.84	4.03	‒
Large annular 1	1.94	‒	0.20	4.17	4.37	‒
X dipole 1	‒	‒	0.19	‒	‒	‒
Y dipole 1	‒	‒	‒	4.28	‒	‒
0° quadrupole 1	2.92	‒	0.20	3.93	‒	5.52
45° quadrupole 1	‒	0.31	0.20	4.06	4.25	‒

Table 4. Illumination nonuniformity under the seven illumination modes
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Table 4. Illumination nonuniformity under the seven illumination modes
Illumination mode Nonuniformity /%
Conventional 1 3.45
Small annular 1 3.32
Large annular 1 1.27
X dipole 1 3.33
Y dipole 1 1.25
0° quadrupole 1 2.14
45° quadrupole 1 2.51

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Xin Wang, Zhongliang Li, Chunxiao Yuan. Pupil-Shaping Technique in Extreme Ultraviolet Lithography Illumination System[J]. Chinese Journal of Lasers, 2024, 51(12): 1202412

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