Pupil-Shaping Technique in Extreme Ultraviolet Lithography Illumination System

Xin Wang; Zhongliang Li; Chunxiao Yuan

doi:10.3788/CJL240575

Chinese Journal of Lasers, Volume. 51, Issue 12, 1202412(2024)

Pupil-Shaping Technique in Extreme Ultraviolet Lithography Illumination System

Xin Wang^1,2, Zhongliang Li^1,2、*, and Chunxiao Yuan¹

¹Advanced Light Source and System R&D Center, Department of Advanced Optical and Microelectronic Equipment, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²College of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

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Xin Wang, Zhongliang Li, Chunxiao Yuan. Pupil-Shaping Technique in Extreme Ultraviolet Lithography Illumination System[J]. Chinese Journal of Lasers, 2024, 51(12): 1202412

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Paper Information

Category: Laser Micro-Nano Manufacturing

Received: Feb. 5, 2024

Accepted: Mar. 19, 2024

Published Online: Jun. 11, 2024

The Author Email: Zhongliang Li (lizhongliang@siom.ac.cn)

DOI:10.3788/CJL240575

CSTR:32183.14.CJL240575

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology