Optimal trajectory tracking control of unmanned surface vehicle formation under unknown disturbances

参数	数值	参数	数值	参数	数值
m	23.8	$ {Y_v} $	−0.861 2	$ {X_{\dot u}} $	−2
$ {I_{\textit{z}}} $	1.76	$ {Y_{\|v\|v}} $	−36.282 3	$ {Y_{\dot v}} $	−10
$ {x_g} $	0.046	$ {Y_r} $	0.107 9	$ {Y_{\dot r}} $	0
$ {X_u} $	−0.722 5	$ {N_v} $	0.105 2	$ {N_{\dot v}} $	0
$ {X_{\|u\|u}} $	−1.327 4	$ {N_{\|v\|v}} $	5.043 7	$ {N_{\dot r}} $	−1
$ {X_{uuu}} $	−5.866 4

Table 2. The initial state of USV formation

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Table 2. The initial state of USV formation

变量	数值	变量	数值
$ {{\boldsymbol{\eta}} _{\rm{d}}} $	$ {[183,35,1.5]^{\rm{T}}} $	$ {{\boldsymbol{\upsilon}} _{\rm{d}}} $	$ {[0.2,0,0]^{\rm{T}}} $
$ {{\boldsymbol{\eta}} _1} $	$ {[174,33,1.4]^{\rm{T}}} $	$ {{\boldsymbol{\upsilon}} _1} $	$ {[0,0,0]^{\rm{T}}} $
$ {{\boldsymbol{\eta}} _2} $	$ {[193,33,1.6]^{\rm{T}}} $	$ {{\boldsymbol{\upsilon}} _2} $	$ {[0,0,0]^{\rm{T}}} $
$ {{\boldsymbol{\eta}} _3} $	$ {[{\text{18}}3,28,1.5]^{\rm{T}}} $	$ {{\boldsymbol{\upsilon}} _3} $	$ {[0,0,0]^{\rm{T}}} $

Table 3. Performance comparisons of Backstepping and FDO-OBC

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Table 3. Performance comparisons of Backstepping and FDO-OBC

MIAE参数	FDO-OBC算法的MIAE	反步法^[28] 的MIAE
$ {x}_{e1}，{x}_{e2}，{x}_{e3} $	0.090，0.110，0.111	0.128，0.180，0.153
$ {y}_{e1}，{y}_{e2}，{y}_{e3} $	0.101，0.105，0.107	0.167，0.138，0.117
$ {\psi }_{e1}，{\psi }_{e2}，{\psi }_{e3} $	0.012，0.015，0.009	0.167，0.138，0.042
$ {u}_{e1}，{u}_{e2}，{u}_{e3} $	0.224，0.266，0.332	0.308，0.319，0.372
$ {v}_{e1}，{v}_{e2}，{v}_{e3} $	0.237，0.224，0.236	0.316，0.338，0.185
$ {r}_{e1}，{r}_{e2}，{r}_{e3} $	0.093，0.115，0.051	0.284，0.314，0.102

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Ning WANG, Yongjin LIU, Ying GAO. Optimal trajectory tracking control of unmanned surface vehicle formation under unknown disturbances[J]. Chinese Journal of Ship Research, 2024, 19(1): 178

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Paper Information

Category:

Received: May. 5, 2023

Accepted: --

Published Online: Mar. 18, 2025

The Author Email:

DOI:10.19693/j.issn.1673-3185.03348

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology