Properties of HfO<sub>2</sub>‐SiO<sub>2</sub> Mixed Coatings with Different Mixing Ratios

Dianfu Feng; Yun Cui; Chunxian Tao; Feng Yang; Ge Zhang; Xiaoyu Yang; Jianda Shao

doi:10.3788/CJL241030

Chinese Journal of Lasers, Volume. 52, Issue 6, 0603102(2025)

Properties of HfO₂‐SiO₂ Mixed Coatings with Different Mixing Ratios

Dianfu Feng², Yun Cui^1、*, Chunxian Tao^2、**, Feng Yang³, Ge Zhang¹, Xiaoyu Yang², and Jianda Shao⁴

¹Precision Optical Manufacturing and Testing Center, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201815, China

²School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China

³Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China

⁴Key Laboratory of Materials for High Power Laser, Chinese Academy of Sciences, Shanghai 201800, China

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References(31)

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Dianfu Feng, Yun Cui, Chunxian Tao, Feng Yang, Ge Zhang, Xiaoyu Yang, Jianda Shao. Properties of HfO₂‐SiO₂ Mixed Coatings with Different Mixing Ratios[J]. Chinese Journal of Lasers, 2025, 52(6): 0603102

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Paper Information

Category: Thin Films

Received: Jul. 4, 2024

Accepted: Oct. 22, 2024

Published Online: Mar. 18, 2025

The Author Email: Yun Cui (cuiyun@siom.ac.cn), Chunxian Tao (Tao@usst.edu.cn)

DOI:10.3788/CJL241030

CSTR:32183.14.CJL241030

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology