Absorption measurement of optical thin films under high power density with a Closed Cavity

Lenses	$M_{1}$	$M_{2}$	$M_{3}$	$M_{4}$
Size (mm)	$Φ 50$	$Φ 50$	$Φ 50$	$Φ 50$
Substrate	monocrystalline silicon	monocrystalline silicon	monocrystalline silicon	monocrystalline silicon
Optical thin film	multilayer dielectric film	multilayer dielectric film	multilayer dielectric film	multilayer dielectric film
Specific heat ratio ( $J / (g \times K)$ )	0.71	0.71	0.71	0.71
Reflectance	$\sim 99.9 %$	$\sim 99.9 %$	$\sim 99.9 %$	$\sim 99.9 %$
Mass (g)	18.059	13.384	18.174	18.178
Running time (s)	100	100	100	100
Equilibrium temperature rise (K)	4.79	10.16	5.08	4.01
Absorption coefficient (ppm)	95.1	149.6	101.6	80.2

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Xiaoting Fang, Shengfu Yuan, Wenguang Liu, Baozhu Yan, Bing Huang, "Absorption measurement of optical thin films under high power density with a Closed Cavity," Chin. Opt. Lett. 13, 033101 (2015)

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Paper Information

Category: Thin films

Received: Sep. 4, 2014

Accepted: Jan. 16, 2015

Published Online: Sep. 25, 2018

The Author Email: Shengfu Yuan (shengfuyuan_bb@163.com)

DOI:10.3788/COL201513.033101

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology