Chinese Optics, Volume. 16, Issue 6, 1512(2023)

InGaAs/AlGaAs quantum well intermixing induced by Si impurities under multi-variable conditions

Cui-cui LIU1, Nan LIN2,3, Xiao-yu MA2,3、*, Yue-ming ZHANG4, and Su-ping LIU2
Author Affiliations
  • 1National Innovation Center of Radiation Application, China Institute of Atomic Energy, Beijing 102413, China
  • 2National Engineering Research Center for Optoelectronics Devices, Institute of Semiconductors, CAS, Beijing 100083, China
  • 3College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 101408, China
  • 4Hitachi High-tech Scientific Solutions (Beijing) Co., Ltd., Beijing 100012, China
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    References(17)

    [9] GE X H, ZHANG R Y, GUO CH Y, et al. Multiple factor ion implantation-induced quantum well intermixing effect[J]. Laser & Optoelectronics Progress, 57, 011409(2020).

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    Cui-cui LIU, Nan LIN, Xiao-yu MA, Yue-ming ZHANG, Su-ping LIU. InGaAs/AlGaAs quantum well intermixing induced by Si impurities under multi-variable conditions[J]. Chinese Optics, 2023, 16(6): 1512

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    Paper Information

    Category: Original Article

    Received: Dec. 28, 2022

    Accepted: Sep. 21, 2023

    Published Online: Nov. 29, 2023

    The Author Email: Xiao-yu MA (maxy@semi.ac.cn)

    DOI:10.37188/CO.2022-0257

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