Chinese Journal of Lasers, Volume. 39, Issue 9, 909001(2012)
Alignment Scheme Research Based on Equivalent Overlapped Gratings for Reflective Lithography Alignment
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Zhu Jiangping, Hu Song, Yu Junsheng, Tang Yan, Zhou Shaolin, Liu Qi, He Yu. Alignment Scheme Research Based on Equivalent Overlapped Gratings for Reflective Lithography Alignment[J]. Chinese Journal of Lasers, 2012, 39(9): 909001
Paper Information
Category: holography and information processing
Received: Apr. 20, 2012
Accepted: --
Published Online: Jul. 4, 2012
The Author Email: Jiangping Zhu (zsyioe@163.com)
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