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Chinese Journal of Lasers, Volume. 39, Issue 9, 909001(2012)

Alignment Scheme Research Based on Equivalent Overlapped Gratings for Reflective Lithography Alignment

Zhu Jiangping1,2,3、*, Hu Song1, Yu Junsheng2, Tang Yan1, Zhou Shaolin4, Liu Qi1,3, and He Yu1,3
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  • 1[in Chinese]
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    Zhu Jiangping, Hu Song, Yu Junsheng, Tang Yan, Zhou Shaolin, Liu Qi, He Yu. Alignment Scheme Research Based on Equivalent Overlapped Gratings for Reflective Lithography Alignment[J]. Chinese Journal of Lasers, 2012, 39(9): 909001

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    Paper Information

    Category: holography and information processing

    Received: Apr. 20, 2012

    Accepted: --

    Published Online: Jul. 4, 2012

    The Author Email: Jiangping Zhu (zsyioe@163.com)

    DOI:10.3788/cjl201239.0909001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology