Chinese Journal of Lasers, Volume. 37, Issue 8, 2029(2010)
Measurement Error Analysis of High Precision Fizeau Interferometer for Lithography Projection Objective
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Miao Erlong, Zhang Jian, Gu Yongqiang, Kang Yusi, Liu Weiqi. Measurement Error Analysis of High Precision Fizeau Interferometer for Lithography Projection Objective[J]. Chinese Journal of Lasers, 2010, 37(8): 2029
Paper Information
Category: measurement and metrology
Received: Oct. 16, 2009
Accepted: --
Published Online: Aug. 13, 2010
The Author Email: Miao Erlong (mel@mail.ustc.edu.cn)
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