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Chinese Journal of Lasers, Volume. 37, Issue 8, 2029(2010)

Measurement Error Analysis of High Precision Fizeau Interferometer for Lithography Projection Objective

Miao Erlong1、*, Zhang Jian1,2, Gu Yongqiang1,2, Kang Yusi1, and Liu Weiqi1
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    Miao Erlong, Zhang Jian, Gu Yongqiang, Kang Yusi, Liu Weiqi. Measurement Error Analysis of High Precision Fizeau Interferometer for Lithography Projection Objective[J]. Chinese Journal of Lasers, 2010, 37(8): 2029

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    Paper Information

    Category: measurement and metrology

    Received: Oct. 16, 2009

    Accepted: --

    Published Online: Aug. 13, 2010

    The Author Email: Erlong Miao (mel@mail.ustc.edu.cn)

    DOI:10.3788/cjl20103708.2029

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology