Chinese Optics, Volume. 15, Issue 4, 722(2022)

Electrostatic discharge failure characteristics of oxide vertical cavity surface emitting lasers

Yu-qi ZHANG1,2, Qiang KAN3, and Jia ZHAO1,4、*
Author Affiliations
  • 1Key Laboratory of Laser & Infrared System, Ministry of Education, Shandong University, Qingdao 266237, China
  • 2Xiamen San 'An Integrated Circuit Co., LTD, Xiamen 361000, China
  • 3Institute of Semiconductors, University of Chinese Academy of Sciences, Beijing 100083, China
  • 4School of Information Science and Engineering, Shandong University, Qingdao 266237, China
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    Figures & Tables(8)
    Typical test circuit models of an ESD. (a) HBM; (b) MM; (c) CDM and (d) corresponding current waveforms
    (a) Comparison of L-I-V curve before and after forward HBM shock. Inset is an EMMI image under 700 V impulse voltage. (b) PV-TEM, the insert is an enlarged view of the white dotted part and (c) XS-TEM after forward HBM shock under 700 V impulse voltage, the insert is XS-TEM near the oxide tip of sample without an ESD shock
    (a) Comparison of L-I-V curve before and after reverse HBM shock. The insert is an EMMI image under 180 V impulse voltage. (b) PV-TEM and (c) XS-TEM after reverse HBM shock under 180 V impulse voltage
    (a) Comparison of L-I-V curve before and after forward/reverse HBM shock. The insert is an EMMI image under 160 V impulse voltage. (b) PV-TEM and (c) XS-TEM after forward/reverse HBM shock under an 160 V impulse voltage
    (a) Comparison of L-I-V curve before and after MM shock. The insert is an EMMI image under a damaging impulse voltage. (b) PV-TEM and (c) XS-TEM after MM shock
    (a) Comparison of L-I-V curve before and after CDM shock. The insert is an EMMI image under a 2000 V impulse voltage; (b) PV-TEM and (c) XS-TEM after CDM shock
    (a) Comparison of L-I-V curve before and after EOS shock. The inset is an EMMI image under a 45 mA 960 s surge; (b) PV-TEM and (c) XS-TEM after EOS shock under a 45 mA 960 s surge. The inserts are partial enlarged views.
    • Table 1. Summary of failure characteristics corresponding to different ESD models in oxide VCSELs

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      Table 1. Summary of failure characteristics corresponding to different ESD models in oxide VCSELs

      ESD模式损伤阈值光电特性EMMI和TEM失效特征可能的失效机理
      正向HBM700 V出光功率逐渐下降,阈值小幅度增加,反向漏电不变,高电流下电压微降EMMI无亮点;器件内部无集中的击穿位错,在氧化孔边缘出现位错,有源区未出现明显的损伤焦耳热产生的过量热应力导致在应力集中的氧化尖端出现位错; 氧化层对该ESD模式的脉冲表现为电阻特性
      反向HBM−180 V出光功率快速下降,阈值增加,反向漏电变大,正向I-V特性无明显变化EMMI有亮点,和TEM集中的击穿位错位置吻合;比正向HBM模式的位错密度高,击穿位错出现在靠近氧化孔边缘的出光孔内,有源区出现局部融合现象,DBR中含高镓层的缺陷较为严重隧道击穿效应; 氧化层对该ESD模式的脉冲表现为电阻特性
      正/反向HBM±160 V出光功率快速下降,阈值增加,反向漏电变大,高电流下电压微增EMMI有亮点,和TEM集中的击穿位错位置吻合;与反向HBM失效特征相似,位错大小为微米量级,氧化孔边缘和有源区出现永久性损伤隧道击穿和热的累积效应; 氧化层对该ESD模式的脉冲表现为电阻特性
      MM50 V出光功率快速下降,阈值增加,反向漏电变大,正向电压增加EMMI有亮点,和TEM集中的击穿位错位置吻合;氧化孔边缘的两侧出现大量位错,直径大小为数百纳米量级。位错从氧化层以上延伸到有源区,高镓含量层位错密度较高。有时会出现轻微的氧化层介质击穿现象隧道击穿效应; 氧化层相对于该ESD模式的脉冲表现为部分电容特性部分电阻特性
      CDM2000 VL-I-V特性基本不变,高电流时出光功率微降,阈值不变,反向漏电微增,正向电压下降EMMI无亮点;器件内部无集中的击穿位错,整个氧化层出现介质击穿,分布在氧化孔的周围,并呈现出环状图案。在氧化孔边缘和有源区未观察到明显的缺陷介质击穿; 氧化层相对于该ESD模式的脉冲等效为电容特性
      EOS/出光功率逐渐下降,阈值增加,反向漏电增大,正向电压下降EMMI无亮点;器件内部无集中的击穿位错,高电流密度的应力驱动下,氧化孔边缘出现暗点缺陷和分层现象焦耳热产生的过量热应力
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    Yu-qi ZHANG, Qiang KAN, Jia ZHAO. Electrostatic discharge failure characteristics of oxide vertical cavity surface emitting lasers[J]. Chinese Optics, 2022, 15(4): 722

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    Paper Information

    Category: Original Article

    Received: Dec. 20, 2021

    Accepted: Mar. 23, 2022

    Published Online: Sep. 6, 2022

    The Author Email:

    DOI:10.37188/CO.2021-0226

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