Laser & Optoelectronics Progress, Volume. 57, Issue 3, 032202(2020)

High-Precision ITO Electrode Wet Etching Technology Based on Maskless Lithography

Yi Yin1, Zhijian Liu1、*, Saijie Wang1, Sen Wu1, Zhijun Yan1, and Xinxiang Pan2
Author Affiliations
  • 1Marine Engineering College of Dalian Maritime University, Dalian, Liaoning 116026, China
  • 2College of Ocean Engineering, Guangdong Ocean University, Zhanjiang, Guangdong 524088, China
  • show less
    Cited By

    Article index updated: Sep. 11, 2025

    The article is cited by 1 article(s) CLP online library. (Some content might be in Chinese.)
    Tools

    Get Citation

    Copy Citation Text

    Yi Yin, Zhijian Liu, Saijie Wang, Sen Wu, Zhijun Yan, Xinxiang Pan. High-Precision ITO Electrode Wet Etching Technology Based on Maskless Lithography[J]. Laser & Optoelectronics Progress, 2020, 57(3): 032202

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Optical Design and Fabrication

    Received: Jun. 11, 2019

    Accepted: Aug. 12, 2019

    Published Online: Feb. 17, 2020

    The Author Email: Zhijian Liu (liuzhijian@dlmu.edu.cn)

    DOI:10.3788/LOP57.032202

    Topics