Chinese Journal of Lasers, Volume. 10, Issue 3, 136(1983)
CW CO2 laser annealing of arsenic implanted silicon
References(3)
[1] [1] S. C. Tsou et al., Appl. Phys., 1980, 23, 163.
[2] [2] C. W. White et al., J. Appl. Phys., 1979, 50, 3261.
[3] [3] H. F. Wolf; Silicon Semiconductor Data, 1969, Pergamon Press, New York, p. 136.
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Lin Chenglu, Lin Zixin, Zou Shichang, Fan Baohua, Wu Hengxian. CW CO2 laser annealing of arsenic implanted silicon[J]. Chinese Journal of Lasers, 1983, 10(3): 136
Paper Information
Category: laser devices and laser physics
Received: Mar. 20, 1982
Accepted: --
Published Online: Aug. 31, 2012
The Author Email:
CSTR:32186.14.
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