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Chinese Journal of Lasers, Volume. 10, Issue 3, 136(1983)

CW CO2 laser annealing of arsenic implanted silicon

Lin Chenglu1, Lin Zixin1, Zou Shichang1, Fan Baohua2, and Wu Hengxian3
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    Lin Chenglu, Lin Zixin, Zou Shichang, Fan Baohua, Wu Hengxian. CW CO2 laser annealing of arsenic implanted silicon[J]. Chinese Journal of Lasers, 1983, 10(3): 136

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    Paper Information

    Category: laser devices and laser physics

    Received: Mar. 20, 1982

    Accepted: --

    Published Online: Aug. 31, 2012

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology