Journal of Semiconductors, Volume. 45, Issue 7, 072303(2024)
Dual-phase coexistence enables to alleviate resistance drift in phase-change films
Fig. 1. (Color online) (a) Relationship between sheet resistance and annealing temperature at heating rate of 30 °C/min. (b) Plot of failure time versus reciprocal temperature and (c) sheet resistance as a function of time for SnS-doped GST films at 50 °C for up to 103 s.
Fig. 2. (Color online) (a) Plot of (αhν)1/2 vs. hν for pure GST and SnS-doped GST samples. (b) Relationship between electrical conductivity and the reciprocal temperature for amorphous GST and SnS-doped GST films.
Fig. 3. (Color online) X-ray diffraction patterns of as-deposited and annealed (a) (SnS)8.8(GST)91.2, (b) (SnS)35.1(GST)64.9, and (c) (SnS)54.6(GST)45.4 films.
Fig. 4. (Color online) Raman scattering spectra of as-deposited and annealed (a) pure SnS, (b) (SnS)8.8(GST)91.2, (c) (SnS)35.1(GST)64.9, and (d) (SnS)54.6(GST)45.4, respectively.
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Tong Wu, Chen Chen, Jinyi Zhu, Guoxiang Wang, Shixun Dai. Dual-phase coexistence enables to alleviate resistance drift in phase-change films[J]. Journal of Semiconductors, 2024, 45(7): 072303
Category: Articles
Received: Apr. 9, 2024
Accepted: --
Published Online: Jul. 18, 2024
The Author Email: Guoxiang Wang (GXWang)