Infrared and Laser Engineering, Volume. 51, Issue 9, 20220531(2022)

High-efficiency and high-quality combined polishing method of zinc selenide crystal (invited)

Chao Yang1, Naiwen Zhang1, and Yang Bai2
Author Affiliations
  • 1School of Optoelectronic Engineering, Changchun University of Science and Technology, Changchun 130022, China
  • 2Changchun Institute of Optics, Fine Mechanis and Physics, Chinese Academy of Sciences, Changchun 130033, China
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    Figures & Tables(13)
    SEM image of CIPs
    Initial roughness of ZnSe test piece
    Picture of the experimental process
    Experimental results of the removal function
    Material removal efficiency and roughness of ZnSe polished by different magnetorheological polishing liquids
    Roughness of the material after processing with No. 2 magnetorheological fluid
    Physical drawing of polishing pad
    Surface roughness of the material after CCOS fine polishing
    • Table 1. Characteristic and properties of ZnSe

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      Table 1. Characteristic and properties of ZnSe

      MaterialTypeCrystal structure Hv/ GPa Grain size/μm Density/ g·mm−3
      ZnSePolycrystallineCubic0.9±0.0543±95.26
    • Table 2. Composition of MR polishing fluid

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      Table 2. Composition of MR polishing fluid

      IngredientDeionized waterCarbonyl iron powder (CIPs)GlycerinRust inhibitorSodium carbonateCitric acidAuxiliariespolish powder
      Volume fractionOther35%3%0.8%2%0.6%0.2%0.2%
    • Table 3. Process parameter

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      Table 3. Process parameter

      ParameterWheel diameter/mm Rotate speed/r·min−1Penetration depth/mm Magnetic field
      Value1601200.8340 mT
    • Table 4. Experimental results of removal function for different polishing liquid compositions

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      Table 4. Experimental results of removal function for different polishing liquid compositions

      MR polishing fluid seriesAbrasive typeRemoval rate/μm·min−1Roughness/nm
      1single crystal diamond/100 nm5.29
      2Alumina/100 nm1.84
      3Alumina/800 nm3.68.5
      4Polycrystalline diamond/100 nm2.8810
      5Silicon oxide/100 nm0.31.8
      6Cerium oxide/100 nm0.362.5
    • Table 5. Polishing pad parameters

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      Table 5. Polishing pad parameters

      MaterialPolyurethane
      ColorBlack
      Thickness/mm0.8±0.1
      Shore hardness (C) 81±5
      Density/g·cm30.5±0.1
      Compression ratio(1.6±0.5)%
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    Chao Yang, Naiwen Zhang, Yang Bai. High-efficiency and high-quality combined polishing method of zinc selenide crystal (invited)[J]. Infrared and Laser Engineering, 2022, 51(9): 20220531

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    Paper Information

    Category: Special issue—Ultra precision manufacture and testing technology of optical aspheric surface

    Received: Aug. 1, 2022

    Accepted: --

    Published Online: Jan. 6, 2023

    The Author Email:

    DOI:10.3788/IRLA20220531

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