[1] [1] Yang Xiong, Xing Tingwen. Design of extreme ultraviolet lithographic objectives [J]. Acta Optica Sinica, 2009, 29(9): 2520～2523

[2] [2] H. Kang, S. Hansen. EUV simulation extension study for mask shadowing effect and its correction [C]. SPIE, 2008, 6921: 59213

[3] [3] T. Schmoeller, T. Klimpel. EUV pattern shift compensation strategies [C]. SPIE, 2008, 6921: 69211B

[4] [4] Miao Erlong, Zhang Jian, Gu Yongqiang et al.. Measurement error analysis of high precision Fizeau interferometer for lithography projection obejective [J]. Chinese J. Lasers, 2010, 37(8): 2029～2034

[5] [5] Yumi Nakajima. Aberration budget in extreme ultraviolet lithography [C]. SPIE, 2008, 6921: 69211a

[6] [6] Jiang Wenbo, Hu Song, Zhao Lixin et al.. Design and analysis of amplitude photon sieves based on vector diffraction theory [J]. Acta Optica Sinica, 2010, 30(2): 428～432

[7] [7] M. Born, E. Wolf. Principles of Optics [M]. Cambridge: Cambridge University Press, 2001

[8] [8] Guo Chucai, Ye Weimin, Yuan Xiaodong et al.. Research on reflection characteristics of sub-wavelength gratings [J]. Acta Optica Sinica, 2009, 29(12): 3272～3276

[9] [9] Peiyang Yan. Understanding bossing curve asymmetry and focus shift effect in EUV lithography [C]. SPIE, 2002, 4562: 279～287

[10] [10] Konstantinos Adam. Domain Decomposition Methods for the Electromagnetic Simulation of Scattering from Three-Dimensional Structures with Application in Lithography [D]. Berkeley: University of California, 2001

[11] [11] Xu Ma, Gonzalo R. Arce. Binary mask optimization for forward lithography based on the boundary layer model in coherent systems [J]. J. Opt. Soc. Am. A, 2009, 26(7): 1687～1695

[12] [12] Tamer M. Tawfik, Ahmed H. Morshed, Diaa Khalil. Modeling mask scattered field at oblique incidence [C]. SPIE, 2009, 7274: 727433

[13] [13] Johannes Ruoff, Jens Timo Neumann. Polarization-induced astigmatism caused by topographic masks [C]. SPIE, 2007, 6730: 67301t

[14] [14] Andreas Erdmann. Mask modeling in the low k1 and ultrahigh NA regime: phase and polarization effects [C]. SPIE, 2005, 5835: 69～81

[15] [15] S. B. Bollepalli, M. Khan, F. Cerrina. Image formation in extreme ultraviolet lithography and numerical aperture effects [J]. J. Vacuum Sci. & Technol., 1999, 17(6): 2992～2997

[16] [16] Hong Xiaogang, Xu Wengdong, Zhao Chengqiang et al.. Optimal design of surface plasmon resonance films structure [J]. Acta Optica Sinica, 2010, 30(7): 2164～2169