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Acta Optica Sinica, Volume. 31, Issue 4, 405001(2011)

Simplified Model for Mask Diffraction in Extreme-Ultraviolet Projection Lithography

Cao Yuting1,2、*, Wang Xiangzhao1,2, Qiu Zicheng1,2, and Peng Bo1,2
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  • 1[in Chinese]
  • 2[in Chinese]
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    Article index updated: Mar. 10, 2025

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    Cao Yuting, Wang Xiangzhao, Qiu Zicheng, Peng Bo. Simplified Model for Mask Diffraction in Extreme-Ultraviolet Projection Lithography[J]. Acta Optica Sinica, 2011, 31(4): 405001

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    Paper Information

    Category: Diffraction and Gratings

    Received: Sep. 1, 2010

    Accepted: --

    Published Online: Mar. 24, 2011

    The Author Email: Yuting Cao (cytoe@163.com)

    DOI:10.3788/aos201131.0405001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology