Acta Optica Sinica, Volume. 33, Issue 9, 922005(2013)
Manufacturable Design of 16~22 nm Extreme Ultraviolet Lithographic Objective
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Cao Zhen, Li Yanqiu, Liu Fei. Manufacturable Design of 16~22 nm Extreme Ultraviolet Lithographic Objective[J]. Acta Optica Sinica, 2013, 33(9): 922005
Category: Optical Design and Fabrication
Received: Mar. 27, 2013
Accepted: --
Published Online: Aug. 27, 2013
The Author Email: Zhen Cao (feifei4150@yahoo.com.cn)