Acta Optica Sinica, Volume. 33, Issue 9, 922005(2013)

Manufacturable Design of 16~22 nm Extreme Ultraviolet Lithographic Objective

Cao Zhen*, Li Yanqiu, and Liu Fei
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    Cao Zhen, Li Yanqiu, Liu Fei. Manufacturable Design of 16~22 nm Extreme Ultraviolet Lithographic Objective[J]. Acta Optica Sinica, 2013, 33(9): 922005

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Mar. 27, 2013

    Accepted: --

    Published Online: Aug. 27, 2013

    The Author Email: Zhen Cao (feifei4150@yahoo.com.cn)

    DOI:10.3788/aos201333.0922005

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