INFRARED, Volume. 46, Issue 1, 28(2025)

Study on Dislocation Suppression of Silicon-Based HgCdTe Based on High- and Low-Temperature Cyclic Annealing Method

Meng-jia JIANG, Wei-lin SHE, Dan WANG, Zhen LI, Rui ZHOU, Chong-shang GUAN, Wei-rong XING, and Jia-jia NIU
Author Affiliations
  • The 11th Research Institute of China Electronics Technology Group Corporation, Beijing 100015, China
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    References(6)

    [5] [5] Astles M G, Shaw N, Blackmore G, et al. Improved Control of Composition and Electrical Properties of Liquid Phase Epitaxial (CdHg)Te Layers[J]. Journal of Crystal Growth, 1992, 117(1-4): 213-217.

    [7] [7] Carmody M, Lee D, Zandian M, et al. Threading and Misfit-dislocation Motion in Molecular-beam Epitaxy[J]. Journal of Electronic Materials, 2003, 32(7): 710-716.

    [8] [8] Brill G, Farrell S, Chen Y P, et al. Dislocation Reduction of HgCdTe/Si Through Ex Situ Annealing[J]. Journal of Electronic Materials, 2010, 39(7): 967-973.

    [9] [9] Benson J D, Arrell S, Bill G, et al. Dislocation Analysis in (112)B HgCdTe/CdTe/Si[J]. Journal of Electronic Materials, 2011, 40(8): 1847-1853.

    [10] [10] Farrell S, Rao M V, Brill G, et al. Effect of Cycle Annealing Parameters on Dislocation Density Reduction for HgCdTe on Si[J]. Journal of Electronic Materials, 2011, 40(8): 1727-1732.

    [11] [11] Simingalam S, Brill G, Wijewarnawuriya P, et al. Low Temperature, Rapid Thermal Cycle Annealing of HgCdTe Grown on CdTe/Si[J]. Journal of Electronic Materials, 2015, 44(5): 1321-1326.

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    JIANG Meng-jia, SHE Wei-lin, WANG Dan, LI Zhen, ZHOU Rui, GUAN Chong-shang, XING Wei-rong, NIU Jia-jia. Study on Dislocation Suppression of Silicon-Based HgCdTe Based on High- and Low-Temperature Cyclic Annealing Method[J]. INFRARED, 2025, 46(1): 28

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    Paper Information

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    Received: May. 28, 2024

    Accepted: Feb. 18, 2025

    Published Online: Feb. 18, 2025

    The Author Email:

    DOI:10.3969/j.issn.1672-8785.2025.01.004

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