Light and matter co-confined multi-photon lithography: an innovative way to break through the limits of traditional lithography

Jingyu Wang; Zhanfeng Guo; Zhu Wang; Zhengwei Liu; Daixuan Wu; He Tian

doi:10.1088/1674-4926/24110023

Journal of Semiconductors, Volume. 46, Issue 3, 030401(2025)

Light and matter co-confined multi-photon lithography: an innovative way to break through the limits of traditional lithography

Jingyu Wang¹, Zhanfeng Guo¹, Zhu Wang², Zhengwei Liu², Daixuan Wu^1、*, and He Tian^1、**

Author Affiliations

¹School of Integrated Circuits & Beijing National Research Center for Information Science and Technology (BNRist), Tsinghua University, Beijing 100084, China

²Jiangsu Fengbo Equipment Technology Co., Ltd, Wuxi 214000, China

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References(8)

[1] L L Guan, C Cao, X Liu et al. Author correction: Light and matter co-confined multi-photon lithography. Nat Commun, 15, 3730(2024).

[2] M H Hong. Acousto-optic scanning multi-photon lithography with high printing rate. Opto Electron Adv, 7, 240003(2024).

[3] A Wickberg, A Abass, H H Hsiao et al. Second-harmonic generation by 3D laminate metacrystals. Adv Opt Mater, 7, 1801235(2019).

[4] T F Scott, B A Kowalski, A C Sullivan et al. Two-color single-photon photoinitiation and photoinhibition for subdiffraction photolithography. Science, 324, 913(2009).

[5] C Cao, Y W Qiu, L L Guan et al. Dip-In photoresist for photoinhibited two-photon lithography to realize high-precision direct laser writing on wafer. ACS Appl Mater Interfaces, 14, 31332(2022).

[6] C Cao, J T Liu, X M Xia et al. Click chemistry assisted organic-inorganic hybrid photoresist for ultra-fast two-photon lithography. Addit Manuf, 51, 102658(2022).

[7] P Debye. Das verhalten von lichtwellen in der Nähe eines brennpunktes oder einer brennlinie. Ann Der Phys, 335, 755(1909).

[8] L Rayleigh. XII. On the manufacture and theory of diffraction-gratings. Lond Edinb Dublin Philos Mag J Sci, 47, 81(1874).

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Jingyu Wang, Zhanfeng Guo, Zhu Wang, Zhengwei Liu, Daixuan Wu, He Tian. Light and matter co-confined multi-photon lithography: an innovative way to break through the limits of traditional lithography[J]. Journal of Semiconductors, 2025, 46(3): 030401

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Paper Information

Category: Research Articles

Received: Nov. 21, 2024

Accepted: --

Published Online: Apr. 27, 2025

The Author Email: Daixuan Wu (DXWu), He Tian (HTian)

DOI:10.1088/1674-4926/24110023

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology