APPLIED LASER, Volume. 43, Issue 4, 80(2023)

Study on the Laser Marking Process of Silicon Wafer

Li Guoqi1,2、*, Zhang Lingling1,2, and Chen Yu3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    References(4)

    [2] [2] SCHMADLAK I, YEUNG B, MORGAN D, et al. Fracture risk assessment of laser marked Die by means of simulation and test[C]//2015 16th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems. April 19-22, 2015, Budapest, Hungary. NewYork: IEEE, 2015: 1-4.

    [3] [3] BATES G . Laser-material interaction for marking: Wavelength dependence of materials: Metals, plastics, semiconductors, and other materials, Advanced Laser Center, Miyachi Unitek Corporation.

    [11] [11] SHU T J, ZHANG L L, LI G Q, et al. Study on the process of laser marking for silicon wafer by 1060nm-MOPA laser[C]//Proc SPIE 11907, Sixteenth National Conference on Laser Technology and Optoelectronics, SanJose:SPIE Press 2021, 11907: 600-604.

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    Li Guoqi, Zhang Lingling, Chen Yu. Study on the Laser Marking Process of Silicon Wafer[J]. APPLIED LASER, 2023, 43(4): 80

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    Paper Information

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    Received: Apr. 21, 2022

    Accepted: --

    Published Online: Nov. 17, 2023

    The Author Email: Guoqi Li (1057546243@qq.com)

    DOI:10.14128/j.cnki.al.20234304.080

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