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Chinese Optics Letters, Volume. 18, Issue 4, 042602(2020)

Influence of the source’s energy fluctuation on computational ghost imaging and effective correction approaches

Xiaodong Mei1,2, Chenglong Wang1, Yami Fang3, Ting Song3, Wenlin Gong1、*, and Shensheng Han1
Author Affiliations
  • 1Key Laboratory for Quantum Optics and Center for Cold Atom Physics of CAS, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2University of Chinese Academy of Sciences, Beijing 100049, China
  • 3Shanghai Key Laboratory of Aerospace Intelligent Control Technology, Shanghai Aerospace Control Technology Institute, Shanghai 201800, China
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    CLP Journals

    [1] Pengwei Wang, Chenglong Wang, Cuiping Yu, Shuai Yue, Wenlin Gong, Shensheng Han, "Color ghost imaging via sparsity constraint and non-local self-similarity," Chin. Opt. Lett. 19, 021102 (2021)

    [2] Gao Wang, Huaibin Zheng, Zhiguo Tang, Yuchen He, Yu Zhou, Hui Chen, Jianbin Liu, Yuan Yuan, Fuli Li, Zhuo Xu, "Naked-eye ghost imaging via photoelectric feedback," Chin. Opt. Lett. 18, 091101 (2020)

    [3] Junhao Gu, Shuai Sun, Yaokun Xu, Huizu Lin, Weitao Liu, "Feedback ghost imaging by gradually distinguishing and concentrating onto the edge area," Chin. Opt. Lett. 19, 041102 (2021)

    Cited By

    [1] Hui-Zu Lin, Wei-Tao Liu, Shuai Sun, Long-Kun Du. Influence of pulse characteristics on ghost imaging lidar system. Applied Optics, 60, 1623(2021).

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    Xiaodong Mei, Chenglong Wang, Yami Fang, Ting Song, Wenlin Gong, Shensheng Han, "Influence of the source’s energy fluctuation on computational ghost imaging and effective correction approaches," Chin. Opt. Lett. 18, 042602 (2020)

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    Paper Information

    Category: Physical Optics

    Received: Sep. 18, 2019

    Accepted: Dec. 26, 2019

    Published Online: Apr. 15, 2020

    The Author Email: Wenlin Gong (gongwl@siom.ac.cn)

    DOI:10.3788/COL202018.042602

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology