Focus Control Technology in Immersion Lithography

Chen Duan; Mingcheng Zong; Wei Fan; Lulu Meng

doi:10.3788/AOS201838.0912002

Acta Optica Sinica, Volume. 38, Issue 9, 0912002(2018)

Focus Control Technology in Immersion Lithography

Chen Duan^1,2,3、*, Mingcheng Zong^1,2,3、*, Wei Fan^1,2,3, and Lulu Meng^1,3

Author Affiliations

¹ Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China

² University of Chinese Academy of Sciences, Beijing 100049, China

³ Key Laboratory of Microelectronics Devices & Integrated Technology, Institute of Microelectronics,Chinese Academy of Sciences, Beijing 100029, China;

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Chen Duan, Mingcheng Zong, Wei Fan, Lulu Meng. Focus Control Technology in Immersion Lithography[J]. Acta Optica Sinica, 2018, 38(9): 0912002

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Paper Information

Category: Instrumentation, Measurement and Metrology

Received: Feb. 26, 2018

Accepted: Apr. 4, 2018

Published Online: May. 9, 2019

The Author Email:

DOI:10.3788/AOS201838.0912002

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