Chinese Journal of Liquid Crystals and Displays, Volume. 40, Issue 6, 846(2025)

Fabrication of photomask based on patterned guest-host liquid crystal

Junhui WANG1, Xuan LIU2, Xia DUAN1, Boyuan LI1, Conglong YUAN1, and Zhigang ZHENG1、*
Author Affiliations
  • 1School of Physics, East China University of Science and Technology, Shanghai 200237, China
  • 2School of Materials Science and Engineering, East China University of Science and Technology, Shanghai 200237, China
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    References(26)

    [10] KANG L, LIN Z S. Deep-ultraviolet nonlinear optical crystals: concept development and materials discovery[J]. Light: Science & Applications, 11, 201(2022).

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    Junhui WANG, Xuan LIU, Xia DUAN, Boyuan LI, Conglong YUAN, Zhigang ZHENG. Fabrication of photomask based on patterned guest-host liquid crystal[J]. Chinese Journal of Liquid Crystals and Displays, 2025, 40(6): 846

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    Paper Information

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    Received: Mar. 5, 2025

    Accepted: --

    Published Online: Jul. 14, 2025

    The Author Email: Zhigang ZHENG (zgzheng@ecust.edu.cn)

    DOI:10.37188/CJLCD.2025-0050

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