Fig. 1. （a） Schematic diagram of dichroic dye absorption， in which the length of the blue arrow is used to indicate the intensity of light； （b） Schematic of liquid crystal mask principle， with orange arrows representing the polarization direction of incident light.

Fig. 2. （a） Curve of transmitted light intensity as a function of the angle between the liquid crystal alignment direction and the incident light polarization direction； （b） POM images at 0° and 90°， scale bar： 200 μm.

Fig. 3. Flowchart of liquid crystal mask fabrication. （a） Schematic diagram of the liquid crystal orientation system based on DMD； （b） （i） POM image of the binary concentric ring structure， （ii） POM image of the grating structure， scale bar： 200 μm.

Fig. 4. Stability test of the liquid crystal mask. （a） POM images of the mask based on E7 during thermal stability testing； （b） POM images of the mask based on TD101-135 during thermal stability testing； （c） Environmental stability test of the liquid crystal mask， scale bar： 500 μm.

Fig. 5. Schematic diagram of the lithography system introducing a liquid crystal mask. The illustration in the lower right corner is a schematic diagram of the three-dimensional structure.

Fig. 6. （a） Beam spatial intensity distribution image captured by the beam quality analyzer， scale bar： 500 μm. （b） SEM image of the grating pattern， scale bar： 5 μm. The top-left corner shows the cross-sectional view of a single grating， scale bar： 1 μm. （c） POM image of the liquid crystal grating， scale bar： 200 μm.（d） Diffraction patterns of the grating captured by the camera. （e） SEM images of various microstructures， scale bar： 20 μm， with a magnified view presented in the upper left corner， scale bar： 5 μm.