Deposition and Absolute Reflectivity Measurements of a Mo/Si Multilayer for 13.1 nm Soft X ray at 45° Incidence Angle

[in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]; [in Chinese]

Chinese Journal of Lasers, Volume. 25, Issue 6, 565(1998)

[in Chinese], [in Chinese], [in Chinese], [in Chinese], and [in Chinese]

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[in Chinese]

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References(3)

[1] [1] D. G. Stearns, R. S. Rosen, S. P. Vernon. Multilayer mirror technology for soft X-ray projection lithography. Appl. Opt., 1993, 32: 6952～6960

[2] [2] G. Gutman. High-performance Mo/Si and WB4C multilayer mirrors for soft X-ray imaging optics. J. X-ray Sci. Technol., 1994, 4: 142～150

[3] [3] Y. H. Guo, Z. X. Fan, O. Bin et al.. Determination of optical constants of thin film in the soft X-ray region. SPIE, 1991, 1519: 327～332

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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Deposition and Absolute Reflectivity Measurements of a Mo/Si Multilayer for 13.1 nm Soft X ray at 45° Incidence Angle[J]. Chinese Journal of Lasers, 1998, 25(6): 565

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Paper Information

Category: materials and thin films

Received: Feb. 14, 1997

Accepted: --

Published Online: Oct. 18, 2006

The Author Email:

DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology