Chinese Journal of Lasers, Volume. 25, Issue 6, 565(1998)
Deposition and Absolute Reflectivity Measurements of a Mo/Si Multilayer for 13.1 nm Soft X ray at 45° Incidence Angle
Reported here is a result of absolute reflectivity measurement carried out in a soft X-ray laser plasma experiment. A 26.2% reflectivity Mo/Si multilayer for 13.1 nm soft X-ray at the 45° incidence angle is obtained.
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Deposition and Absolute Reflectivity Measurements of a Mo/Si Multilayer for 13.1 nm Soft X ray at 45° Incidence Angle[J]. Chinese Journal of Lasers, 1998, 25(6): 565