Self-aligned fiber-based dual-beam source for STED nanolithography

Chinese Optics Letters, Volume. 19, Issue 7, 072201(2021)

Jian Chen, Guoliang Chen, and Qiwen Zhan^*

School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 201800, China

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Jian Chen, Guoliang Chen, Qiwen Zhan, "Self-aligned fiber-based dual-beam source for STED nanolithography," Chin. Opt. Lett. 19, 072201 (2021)

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Paper Information

Category: Optical Design and Fabrication

Received: Sep. 3, 2020

Accepted: Dec. 5, 2020

Posted: Dec. 7, 2020

Published Online: Mar. 22, 2021

The Author Email: Qiwen Zhan (qwzhan@usst.edu.cn)

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