Spectroscopy and Spectral Analysis, Volume. 30, Issue 7, 1793(2010)

Effect of Technological Parameters of Sputtering on the Microstructure of Silicon Film Investigated by Raman Analysis

TIAN Gui*, ZHU Jia-qi, HAN Jie-cai, JIANG Chun-zhu, and JIA Ze-chun
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    References(10)

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    TIAN Gui, ZHU Jia-qi, HAN Jie-cai, JIANG Chun-zhu, JIA Ze-chun. Effect of Technological Parameters of Sputtering on the Microstructure of Silicon Film Investigated by Raman Analysis[J]. Spectroscopy and Spectral Analysis, 2010, 30(7): 1793

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    Paper Information

    Received: Aug. 22, 2009

    Accepted: --

    Published Online: Jan. 26, 2011

    The Author Email: TIAN Gui (tiangui2009@gmail.com)

    DOI:

    CSTR:32186.14.

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