Spectroscopy and Spectral Analysis, Volume. 30, Issue 7, 1793(2010)
Effect of Technological Parameters of Sputtering on the Microstructure of Silicon Film Investigated by Raman Analysis
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TIAN Gui, ZHU Jia-qi, HAN Jie-cai, JIANG Chun-zhu, JIA Ze-chun. Effect of Technological Parameters of Sputtering on the Microstructure of Silicon Film Investigated by Raman Analysis[J]. Spectroscopy and Spectral Analysis, 2010, 30(7): 1793
Paper Information
Received: Aug. 22, 2009
Accepted: --
Published Online: Jan. 26, 2011
The Author Email: Gui TIAN (tiangui2009@gmail.com)
CSTR:32186.14.
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