Chinese Optics Letters, Volume. 17, Issue 4, 040202(2019)
Micro-fabrication process of vapor cells for chip-scale atomic clocks
Figures & Tables(6)
Fig. 1. Structure of vapor cell: (a) 3D structure of vapor cell; (b) cross section of vapor cell.
Fig. 2. Micro-fabrication steps of atomic vapor cell. DRIE, deep reactive ion etching.
Fig. 3. (a) 3D schematic of silicon pore structure; (b) wafer with vapor cells; (c) SEM image of DRIE of vapor cell; (d) enlarged partial view of micro-channel.
Fig. 5. Experimental setup for measurement of the optical-absorption spectrum. TLB, tunable laser; OI, optical isolator; PBS, polarizing beam splitter; NDF, neutral density filter; QWP, quarter-wave plate; M1, high-reflection mirror; PD, photodiode.
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Yanjun Zhang, Yunchao Li, Xuwen Hu, Lu Zhang, Zhaojun Liu, Kaifang Zhang, Shihao Mou, Shougang Zhang, Shubin Yan, "Micro-fabrication process of vapor cells for chip-scale atomic clocks," Chin. Opt. Lett. 17, 040202 (2019)
Paper Information
Category: Atomic and Molecular Physics
Received: Nov. 22, 2018
Accepted: Jan. 25, 2019
Published Online: Apr. 15, 2019
The Author Email: Shubin Yan (shubin_yan@nuc.edu.cn)
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