Chinese Optics Letters, Volume. 13, Issue 9, 091404(2015)

Multiscale analysis of single- and multiple-pulse laser-induced damages in HfO2/SiO2 multilayer dielectric films at 532 nm

Wenwen Liu1,2, Chaoyang Wei1、*, Kui Yi1, and Jianda Shao1
Author Affiliations
  • 1Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Graduate School of Chinese Academy of Sciences, Beijing 100039, China
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    Figures & Tables(11)
    (a) S-on-1 probability curves of 532 nm HR coatings, (b) and (c) are the evolution of LIDT and 100% damage probability threshold versus shot number.
    Damage morphologies for (a)–(c) fluence of 19.7 J/cm2 at 532 nm, (d) 86.7 J/cm2 at 1064 nm in one-on-one mode tested by optical microscopy.
    SEM micrographs of the damage sites shown in Figs. 2(a)–2(c).
    SEM micrograph of the damage site shown in Fig. 2(a).
    Damage morphologies for fluence of (a) 10.5, (b) 12.1 , (c) 19.7 , and (d) 24.9 J/cm2 at shot number N=1.
    Depth information of the plasma scald area for the damage site shown in Fig. 2(a). The probe of the step profiler moves along the white line.
    AFM section analysis and SEM micrograph of damage at 10.5 J/cm2 for N=1.
    Surface profiler of the damage sites at fluence 24.9 J/cm2 for shot number N=1.
    The FIB micrograph of the 532 nm HR coatings.
    Damage morphologies for (a) 18 J/cm2, N=10 and (b) 14.8 J/cm2, N=30, tested by optical microscopy and SEM.
    The AFM section analysis of the damage site shown in Fig. 10(a).
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    Wenwen Liu, Chaoyang Wei, Kui Yi, Jianda Shao, "Multiscale analysis of single- and multiple-pulse laser-induced damages in HfO2/SiO2 multilayer dielectric films at 532 nm," Chin. Opt. Lett. 13, 091404 (2015)

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    Paper Information

    Category: Lasers and Laser Optics

    Received: Apr. 24, 2015

    Accepted: Jun. 30, 2015

    Published Online: Sep. 14, 2018

    The Author Email: Chaoyang Wei (siomwei@siom.ac.cn)

    DOI:10.3788/COL201513.091404

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