Chinese Optics Letters, Volume. 13, Issue 9, 091404(2015)
Multiscale analysis of single- and multiple-pulse laser-induced damages in HfO2/SiO2 multilayer dielectric films at 532 nm
Fig. 1. (a)
Fig. 2. Damage morphologies for (a)–(c) fluence of
Fig. 3. SEM micrographs of the damage sites shown in Figs.
Fig. 5. Damage morphologies for fluence of (a)
Fig. 6. Depth information of the plasma scald area for the damage site shown in Fig.
Fig. 7. AFM section analysis and SEM micrograph of damage at
Fig. 8. Surface profiler of the damage sites at fluence
Fig. 10. Damage morphologies for (a)
Fig. 11. The AFM section analysis of the damage site shown in Fig.
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Wenwen Liu, Chaoyang Wei, Kui Yi, Jianda Shao, "Multiscale analysis of single- and multiple-pulse laser-induced damages in HfO2/SiO2 multilayer dielectric films at 532 nm," Chin. Opt. Lett. 13, 091404 (2015)
Category: Lasers and Laser Optics
Received: Apr. 24, 2015
Accepted: Jun. 30, 2015
Published Online: Sep. 14, 2018
The Author Email: Chaoyang Wei (siomwei@siom.ac.cn)