Multiscale analysis of single- and multiple-pulse laser-induced damages in HfO<sub>2</sub>/SiO<sub>2</sub> multilayer dielectric films at 532 nm

Wenwen Liu; Chaoyang Wei; Kui Yi; Jianda Shao

doi:10.3788/COL201513.091404

Chinese Optics Letters, Volume. 13, Issue 9, 091404(2015)

Multiscale analysis of single- and multiple-pulse laser-induced damages in HfO₂/SiO₂ multilayer dielectric films at 532 nm

Wenwen Liu^1,2, Chaoyang Wei^1、*, Kui Yi¹, and Jianda Shao¹

Author Affiliations

¹Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²Graduate School of Chinese Academy of Sciences, Beijing 100039, China

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Wenwen Liu, Chaoyang Wei, Kui Yi, Jianda Shao, "Multiscale analysis of single- and multiple-pulse laser-induced damages in HfO₂/SiO₂ multilayer dielectric films at 532 nm," Chin. Opt. Lett. 13, 091404 (2015)

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Paper Information

Category: Lasers and Laser Optics

Received: Apr. 24, 2015

Accepted: Jun. 30, 2015

Published Online: Sep. 14, 2018

The Author Email: Chaoyang Wei (siomwei@siom.ac.cn)

DOI:10.3788/COL201513.091404

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology