[1] [1] O. Apel, K. Mann, J. Heber et al.. Nonlinear absorption phenomena in oxide coatings for 193 nm [C]. SPIE, 1999, 3902:235~241

[2] [2] O. Apel, K. Mann, A. Zoeller et al.. Nonlinear absorption of thin Al2O3 films at 193 nm [J]. Appl. Opt., 2000, 39(18):3165～3169

[3] [3] J. Ferre-Borrull, A. Duparre, E. Quesnel. Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm [J]. Appl. Opt., 2000, 39(31):5854～5864

[4] [4] S. Gliech, J. Steinert, A. Duparre. Light-scattering measurements of optical thin-film components at 157 and 193 nm [J]. Appl. Opt., 2002, 41(16):3224～3235

[5] [5] A. Duparre, R. Thielsch, N. Kaiser et al.. Surface finish and optical quality of CaF2 for UV-lithography applications [C]. SPIE, 1998, 3334:1048～1054

[7] [7] G. P. Callahan, B. K. Flint. Characteristics of deep UV optics at 193 nm & 157 nm [C]. SPIE, 1998, 3578:45～53

[8] [8] F. Rainer, W. Howard Lowdermilk, D. Milam et al.. Materials for optical coatings in the ultraviolet [J]. Appl. Opt., 1985, 24(4):496～500

[9] [9] E. Welsch, K. Ettrich, H. Blaschke et al.. Investigation of the absorption induced damage in ultraviolet dielectric thin films [J]. Opt. Eng., 1997, 36(2):504～514