Chinese Journal of Lasers, Volume. 31, Issue 12, 1469(2004)
Effect of Absorption Character to the Reflectance of 193 nm HfO2/SiO2, Y2O3/SiO2 and Al2O3/SiO2 Multilayer Thin Films
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[in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Effect of Absorption Character to the Reflectance of 193 nm HfO2/SiO2, Y2O3/SiO2 and Al2O3/SiO2 Multilayer Thin Films[J]. Chinese Journal of Lasers, 2004, 31(12): 1469
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