Research Progress in Generation and Spectral Technology of High‑Repetition‑Rate Extreme‑Ultraviolet‑Light Sources

Ji Wang; Kun Zhao

doi:10.3788/CJL231498

Chinese Journal of Lasers, Volume. 51, Issue 7, 0701002(2024)

Research Progress in Generation and Spectral Technology of High‑Repetition‑Rate Extreme‑Ultraviolet‑Light Sources

Ji Wang^1,2 and Kun Zhao^1,2、*

¹Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China

²Songshan Lake Materials Laboratory, Dongguan 523808, Guangdong , China

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Figures & Tables(5)

Fig. 1. Phase matching pressure corresponding to 17th order high harmonic when wavelength of driving light is 820 nm^[75]

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Fig. 2. Schematics of grating installation^[96]. (a) CDM; (b) OPM

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Fig. 3. Performances of pump-probe light sources in which hollow marks indicate that XUV linewidth of experimental device is determined by monochromator, and solid marks indicate that XUV linewidth of device is determined by light source itself

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Fig. 4. Space charge effect in pump-probe experiment^[105]

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Table 1. Summary of fluxes of typical high-harmonic light sources

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Table 1. Summary of fluxes of typical high-harmonic light sources

Ref.	Pulse energy of driving laser	Pulse duration /fs	Repetition rate /kHz	Photon flux at sample	Scheme for higher conversion efficiency	Gas target type
［52］	4000 μJ @ 800 nm	50	1	5.5×10¹⁰ photon/s @central photon energy of 26.4 eV	Focusing with focal length of 500 mm
［47］	1000 μJ @ 780 nm	30	1	1.6×10¹⁰ photon/s @ central photon energy of 32.5 eV	Focusing with focal length of 250 mm
［50］	1000 μJ @ 800 nm	45	6	2.3×10¹¹ photon/s @ central photon energy of 36.3 eV	Focusing with focal length of 400 mm
［48］	2800 μJ @ 785 nm	40	10	6×10⁸ photon/s @ central photon energy of 32.6 eV	Focusing with focal length of 600 mm
［49］	300 μJ @ 390 nm	25	10	1×10⁹ photon/s @ central photon energy of 22.1 eV	SHG and waveguide
［55］	1000 μJ @ 1030 nm	6	100	2.8×10¹⁰ photon/s @ central photon energy of 34.9 eV	Focusing with focal length of 900 mm	Water cooled gas cell
［59］	67 μJ @ 513 nm	280	150	2.5×10⁸ photon/s @ central photon energy of 21.8 eV	SHG + tight focusing	Gas cell
［60］	29 μJ @ 515 nm	290	200	6×10⁹ photon/s @ central photon energy of 16.9 eV	SHG + tight focusing	Gas jet + separation chamber
［62］	88 μJ @ 343 nm	461	250	7×10⁸ photon/s @ central photon energy of 25.3 eV	THG + annular beam + tight focusing	Gas jet + counter nozzle
［56］	12 μJ @ 515 nm	25	400	2×10¹² photon/s @ central photon energy of 21.6 eV	Post compression+two-color field+tight focusing	Gas jet + counter nozzle
［53］	10 μJ @ 330 nm	40	500	2×10¹¹ photon/s @ central photon energy of 21.7 eV	OPCPA + SHG	Gas jet + counter nozzle
［54］	0.33 μJ @ 1045 nm	120	60000	>10¹¹ photon/s @ central photon energy of 25 eV	fsEC	Gas jet

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Ji Wang, Kun Zhao. Research Progress in Generation and Spectral Technology of High‑Repetition‑Rate Extreme‑Ultraviolet‑Light Sources[J]. Chinese Journal of Lasers, 2024, 51(7): 0701002

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Paper Information

Category: laser devices and laser physics

Received: Dec. 11, 2023

Accepted: Feb. 5, 2024

Published Online: Mar. 29, 2024

The Author Email: Kun Zhao (zhaokun@iphy.ac.cn)

DOI:10.3788/CJL231498

CSTR:32183.14.CJL231498

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology