Journal of Synthetic Crystals, Volume. 53, Issue 5, 792(2024)
Research on the Influence of Czochralski Process Parameters on Oxygen Content of N-Type Monocrystalline Silicon
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CHAI Chen, ZHANG Jun, WANG Yulong, HAN Qinghui, LI Huaiming. Research on the Influence of Czochralski Process Parameters on Oxygen Content of N-Type Monocrystalline Silicon[J]. Journal of Synthetic Crystals, 2024, 53(5): 792
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Received: Dec. 19, 2023
Accepted: --
Published Online: Aug. 22, 2024
The Author Email: Chen CHAI (chaichen0304@163.com)
CSTR:32186.14.
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