Rapid Thermal Annealing Characteristics of Mg Doped InN by X-Ray Diffraction

Wang Jian; Xie Zili; Zhang Yun; Teng Long; Li Yecao; Cao Xianlei; Ding Yu; Liu Bin; Xiu Xiangqian; Chen Peng; Han Ping; Shi Yi; Zhang Rong; Zheng Youliao

doi:10.3788/cjl201340.0106003

Chinese Journal of Lasers, Volume. 40, Issue 1, 106003(2013)

Rapid Thermal Annealing Characteristics of Mg Doped InN by X-Ray Diffraction

Wang Jian^*, Xie Zili, Zhang Yun, Teng Long, Li Yecao, Cao Xianlei, Ding Yu, Liu Bin, Xiu Xiangqian, Chen Peng, Han Ping, Shi Yi, Zhang Rong, and Zheng Youliao

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Wang Jian, Xie Zili, Zhang Yun, Teng Long, Li Yecao, Cao Xianlei, Ding Yu, Liu Bin, Xiu Xiangqian, Chen Peng, Han Ping, Shi Yi, Zhang Rong, Zheng Youliao. Rapid Thermal Annealing Characteristics of Mg Doped InN by X-Ray Diffraction[J]. Chinese Journal of Lasers, 2013, 40(1): 106003

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Paper Information

Category: materials and thin films

Received: Jul. 1, 2012

Accepted: --

Published Online: Dec. 5, 2012

The Author Email: Jian Wang (wjwd007@126.com)

DOI:10.3788/cjl201340.0106003

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology