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Optoelectronic Technology, Volume. 42, Issue 1, 22(2022)

Research and Improvement Analysis on the Defects of Photomask Diffraction Mura

Wen LI1, Bing XU1, Qilong XIONG1,2, and Zhijun XU1
Author Affiliations
  • 1Hefei Qingyi Photomask Ltd., Hefei 238000, CHN
  • 2Shenzhen Qingyi Photomask Ltd., Shenzhen Guangdong 518053, CHN
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    [10] Mycronics. Multi-purpose photomask manufacturing gets unparalleled flexibility[webpage]. https：//www.mycronic.com/en/prod-ucts/photomask-equipment/multi-purpose-mask-writer/

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    Wen LI, Bing XU, Qilong XIONG, Zhijun XU. Research and Improvement Analysis on the Defects of Photomask Diffraction Mura[J]. Optoelectronic Technology, 2022, 42(1): 22

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    Paper Information

    Category: Research and Trial-manufacture

    Received: Aug. 24, 2021

    Accepted: --

    Published Online: Aug. 3, 2022

    The Author Email:

    DOI:10.19453/j.cnki.1005-488x.2022.01.005

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology