Optoelectronic Technology, Volume. 42, Issue 1, 22(2022)
Research and Improvement Analysis on the Defects of Photomask Diffraction Mura
Figures & Tables(9)
Fig. 1. Diffraction mura corresponding to different σ (a:
Fig. 2. Micrographs corresponding to different σ (a:
Fig. 4. Diffraction mura corresponding to different temperatures and humidities
Table 1. Mura judgment basis of test plates
View tableView in ArticleTable 1. Mura judgment basis of test plates
可视度 贯穿性 均匀性 特征尺寸/mm 明显或中等可视 轻微或不可视 整版或局部贯穿 非贯穿 整版或局部不均匀 均匀 ≥0.2 <0.2 NG OK NG OK NG OK NG OK
Table 2. Impact of overlap and lithography square overlap ratio
σ on MuraView tableView in ArticleTable 2. Impact of overlap and lithography square overlap ratio
σ on Mura序号 σ/
(%)
设计图形图例 宏观现象 Mura判定 ① 0 干净清晰，
非贯穿，各角度均无不良
OK ② 20 轻微均匀条纹，
无贯穿明暗线
OK ③ 50 重度均匀条纹，
有贯穿明暗线
NG ④ 100 重度均匀条纹，
有大量贯穿明暗线
NG ⑤ 对比组 重度均匀条纹，
有大量贯穿明暗线
NG
Table 3. Influence of different overlap positions on Mura
View tableView in ArticleTable 3. Influence of different overlap positions on Mura
组别 设计图形图例 宏观现象 不良判定 Pixel⁃ITO SD ① 重度均匀条纹，有贯穿明暗线 NG ② 轻微均匀条纹，无明暗线 OK ③ 轻微均匀条纹，无明暗线 OK ④ 轻微均匀条纹，无明暗线 OK
Table 4. Settings of temperature and humidity fluctuation
View tableView in ArticleTable 4. Settings of temperature and humidity fluctuation
项目组别 ①组 ②组 ③组 ④组 相对湿度波动大小/（%） Pixel⁃ITO 7.9 21.4 34.1 49.3 SD 8.2 23.0 32.1 49.0 温度波动大小/（℃） Pixel⁃ITO 0.005 0.01 0.013 0.017 SD 0.004 0.009 0.014 0.018
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Wen LI, Bing XU, Qilong XIONG, Zhijun XU. Research and Improvement Analysis on the Defects of Photomask Diffraction Mura[J]. Optoelectronic Technology, 2022, 42(1): 22
Paper Information
Category: Research and Trial-manufacture
Received: Aug. 24, 2021
Accepted: --
Published Online: Aug. 3, 2022
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