[1] Yubing Mai, Xinrong Xie. The research progress of the third generation semiconductor materials SiC. Guangdong Chemical Industry, 48, 151-152, 155(2021).

[2] Xinyang Liu. Reflections on development and innovation trend of 5 G semiconductor industry. ZTE Technology Journal, 27, 51-52(2021).

[3] Xing Wang, Jianxuan Bao. Effects of nano-SiC powder on rheological behavior of SiC slurry and mechanical properties of RBSC. Infrared and Laser Engineering, 43, 197-202(2014).

[4] Lei Zhang, Mengqi Shao, Zhipeng Xue, et al. Optomechanical structure design and experiment of high-resolution video camera for micro-nano satellite (Invited). Infrared and Laser Engineering, 50, 20210447(2021).

[5] H Suzuki, S Hamada, T Okino, et al. Ultraprecision finishing of micro-aspheric surface by ultrasonic two-axis vibration assisted polishing. CIRP Annals-Manufacturing Technology, 59, 347-350(2010).

[6] Z Zhu, S To, W Zhu, et al. Optimum design of a piezo-actuated tri-axial compliant mechanism for nano-cutting. IEEE Transactions on Industrial Electronics, 65, 6362-6371(2017).

[7] D Zhao, Z Zhu, P Huang, et al. Development of a piezoelectrically actuated dual-stage fast tool servo. Mechanical Systems and Signal Processing, 144, 106873(2020).

[8] Y Gu, X Duan, J Lin, et al. Design, analysis, and testing of a novel 2-DOF vibration-assisted polishing device driven by the piezoelectric actuators. The International Journal of Advanced Manufacturing Technology, 111, 1-23(2020).

[9] X Chen, Y Gu, J Lin, et al. Study on subsurface damage and surface quality of silicon carbide ceramic induced by a novel non-resonant vibration-assisted roll-type polishing. Journal of Materials Processing Technology, 282, 116667(2020).

[10] Jiabin Lu, Qiang Xiong, Qiusheng Yan, et al. Effect of chemical reaction rate in ultraviolet photocatalytic auxiliary SiC polishing process. Surface Technology, 48, 148-158(2019).

[11] Yan He, Zewei Yuan, Zhenyun Duan, et al. High-productively ultraprecise polishing technique polishing of single crystal SiC wafer. Journal of Harbin Institute of Technology, 51, 115-121(2019).

[12] T Yin, P Zhao, T Doi, et al. Effect of using high-pressure gas atmosphere with UV photocatalysis on the CMP characteristics of a 4H-SiC substrate. ECS Journal of Solid State Science and Technology, 10, 024010(2021).

[13] Y Zhou, G Pan, C Zou, et al. Chemical mechanical polishing (CMP) of SiC wafer using photo-catalyst incorporated pad. ECS Journal of Solid State Science & Technology, 6, P603-P608(2017).

[14] B Gao, W J Zhai, Q Zhai, et al. Novel photoelectrochemically combined mechanical polishing technology for scratch-free 4H-SiC surface by using CeO₂-TiO₂ composite photocatalysts and PS/CeO₂ core/shell abrasives. Applied Surface Science, 570, 151141(2021).

[15] R Fagan, Cormack D E Mc, D D Dionysiou, et al. A review of solar and visible light active TiO₂ photocatalysis for treating bacteria, cyanotoxins and contaminants of emerging concern. Materials Science Semiconductor Processing, 42, 2-14(2016).

[16] Jiabin Lu, Qiang Xiong, Qiusheng Yan, et al. Effects of lights modes and abrasives on UV-photocatalysis assisted polishing of 6H-SiC single crystal. Diamond & Abrasives Engineering, 39, 9(2019).

[17] [17] He Yan. Study on the technique mechanism of photocatalysis assisted polishing silicon carbide wafer[D]. Shenyang: Shenyang University of Technology, 2019. (in Chinese)

[18] [18] Khan S A, Zahera M, Khan I A, et al. Photocatalytic degradation of methyl ange by cadmium oxide nanoparticles synthesized by the solgel method [J]. Optik, 2022, 251: 168401.

[19] Jindong Liu, Haorong Li, Guoqing Lin, et al. Research progres of titanium dioxide in the field of solar cells. Guangdong Chemical Industry, 48, 117, 96(2021).

[20] S K Chee, H Suzuki, M Okada, et al. Precision polishing of micro mold by using piezoelectric actuator incorporated with mechanical amplitude magnified mechanism. Advanced Materials Research, 325, 470-475(2011).