(100) and (111) Selective De⁃substrate Technology after Whole⁃sheet Bonding of Silicon⁃based Metals

Jiayi DU; Junyang NIE; Jie SUN; Chang LIN; Dalei WU; Tianxi YANG; Zhonghang HUANG; Qun YAN

doi:10.19453/j.cnki.1005-488x.2023.01.001

Optoelectronic Technology, Volume. 43, Issue 1, 1(2023)

(100) and (111) Selective De⁃substrate Technology after Whole⁃sheet Bonding of Silicon⁃based Metals

Jiayi DU¹, Junyang NIE⁴, Jie SUN^1,3, Chang LIN², Dalei WU², Tianxi YANG², Zhonghang HUANG¹, and Qun YAN²

¹National and Local United Engineering Laboratory of Flat Panel Display Technology, Fuzhou University, and Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China, Fuzhou 35000, CHN

²Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China,Fuzhou 350100, CHN

³Quantum Device Physics Laboratory, Chalmers University of Technology, Göteborg41296, Sweden

⁴Faculty of Electronic and Information Engineering, Xi’an Jiaotong University,Xi’an71009, CHN

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Figures & Tables(6)

Fig. 1. Process steps for silicon-based metal wafer bonding followed by selective de-substrate technology

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Fig. 2. AFM images of wafer surface

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Fig. 3. Schematic of the pyramidal structure formed by coarsening

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Fig. 4. SEM images of surface roughening

Fig. 5. Etching rate

Table 1. Surface area of pyramidal structures formed at different roughening times
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Table 1. Surface area of pyramidal structures formed at different roughening times
粗化时间/min a/µm b/µm h/µm S/µm²
20 ~10.4 ~5.9 ~2.5 ~107.9
30 ~36.9 ~16.8 ~7.6 ~1 201.7
40 ~32.9 ~13.7 ~6.0 ~846.9

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Jiayi DU, Junyang NIE, Jie SUN, Chang LIN, Dalei WU, Tianxi YANG, Zhonghang HUANG, Qun YAN. (100) and (111) Selective De⁃substrate Technology after Whole⁃sheet Bonding of Silicon⁃based Metals[J]. Optoelectronic Technology, 2023, 43(1): 1

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