Graded Multilayer Film Design for Anamorphic Magnification EUV Lithographic Objective

Shihuan Shen; Yanqiu Li; Jiahua Jiang; Yan Liu; Ke Liu; Lihui Liu

doi:10.3788/AOS201737.0822002

Acta Optica Sinica, Volume. 37, Issue 8, 0822002(2017)

Graded Multilayer Film Design for Anamorphic Magnification EUV Lithographic Objective

Shihuan Shen, Yanqiu Li^*, Jiahua Jiang, Yan Liu, Ke Liu, and Lihui Liu

Key Laboratory of Photoelectronic Imaging Technology and System, Ministry of Education, School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, China

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Figures & Tables(15)

Fig. 1. Schematic of Mo/Si multilayer films. (a) Normalized multilayer film; (b) laterally graded multilayer film; (c) depth graded multilayer film

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Fig. 2. Flow chart of laterally and depth graded multilayers combined method

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Fig. 3. Layout of objective

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Fig. 4. Off-axis image field and F1-F15 field points

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Fig. 5. Reflectivity versus incidence angle of normalized multilayer film for mirrors.(a) M1~M3; (b) M4~M6

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Fig. 6. Reflectivity distribution of mirrors with coating (M1~M6) in the center of the field of view F2

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Fig. 7. Reflectivity distribution and wavefront aberration distribution of the system. (a) F2, reflectivity; (b) F15, reflectivity; (c) F2, wavefront aberration; (d) F15, wavefront aberration

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Fig. 8. Thickness distribution of mirrors M2 and M3 depth graded multilayer films. (a) M2; (b) M3

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Fig. 9. Reflectivity versus incidence angle of depth graded multilayer film for mirrors M2 and M3

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Fig. 10. Reflectivity distribution of mirrors M2 and M3. (a) M2; (b) M3

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Fig. 11. Reflectivity distribution and wavefront aberration distribution of the system. (a) F2, reflectivity; (b) F15, reflectivity; (c) F2, wavefront aberration; (d) F15, wavefront aberration

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Table 1. Main design specifications of projective objective
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Table 1. Main design specifications of projective objective
Item Value
Wavelength/nm 13.5
NA 0.50
Magnification 4×8
Exposure field at wafer /mm 26×0.25

Table 2. Incident angles of projection objective system

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Table 2. Incident angles of projection objective system

Parameter	M₁	M₂	M₃	M₄	M₅	M₆
Diameter /mm	249.05	108.62	63.90	201.17	145.69	341.39
Average incident angle /(°)	14.12	24.76	11.36	5.23	10.10	3.62
Incident angle range /(°)	10.37-19.37	16.62-33.60	4.62-16.81	2.54-7.66	0.93-16.67	0.29-5.98

Table 3. Gradient parameters of laterally graded multilayer films
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Table 3. Gradient parameters of laterally graded multilayer films
Mirror C₀ C₂ Y₀
M₁ 1.008 1.025×^-6 70.86
M₂ 1.058 2.259×10^-5 49.06
M₃ 1.066 -1.800×10^-6 -120.90
M₅ 0.994 1.773×10^-6 -9.27

Table 4. Wavefront aberration and Strehl ratio of the systems without coating and with coating
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Table 4. Wavefront aberration and Strehl ratio of the systems without coating and with coating
System without coating System with coating
Field point Wavefront aberration /λ Strehl ratio Wavefront aberration /λ Strehl ratio
F₂ 0.0363 0.941 0.0712 0.819
F₁₅ 0.0649 0.847 0.0645 0.848

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Shihuan Shen, Yanqiu Li, Jiahua Jiang, Yan Liu, Ke Liu, Lihui Liu. Graded Multilayer Film Design for Anamorphic Magnification EUV Lithographic Objective[J]. Acta Optica Sinica, 2017, 37(8): 0822002

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