Graded Multilayer Film Design for Anamorphic Magnification EUV Lithographic Objective

Shihuan Shen; Yanqiu Li; Jiahua Jiang; Yan Liu; Ke Liu; Lihui Liu

doi:10.3788/AOS201737.0822002

Acta Optica Sinica, Volume. 37, Issue 8, 0822002(2017)

Graded Multilayer Film Design for Anamorphic Magnification EUV Lithographic Objective

Shihuan Shen, Yanqiu Li^*, Jiahua Jiang, Yan Liu, Ke Liu, and Lihui Liu

Key Laboratory of Photoelectronic Imaging Technology and System, Ministry of Education, School of Optoelectronics, Beijing Institute of Technology, Beijing 100081, China

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Shihuan Shen, Yanqiu Li, Jiahua Jiang, Yan Liu, Ke Liu, Lihui Liu. Graded Multilayer Film Design for Anamorphic Magnification EUV Lithographic Objective[J]. Acta Optica Sinica, 2017, 37(8): 0822002

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Paper Information

Category: Optical Design and Fabrication

Received: Mar. 29, 2017

Accepted: --

Published Online: Sep. 7, 2018

The Author Email: Li Yanqiu (liyanqiu@bit.edu.cn)

DOI:10.3788/AOS201737.0822002

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