Acta Optica Sinica, Volume. 34, Issue 8, 811002(2014)
Foundation and Application of Model for Multilayers Analysis in Extreme Ultra-Violet Lithography Projection
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Wang Jun, Jin Chunshui, Wang Liping, Guo Benyin, Yu Bo. Foundation and Application of Model for Multilayers Analysis in Extreme Ultra-Violet Lithography Projection[J]. Acta Optica Sinica, 2014, 34(8): 811002
Paper Information
Category: Imaging Systems
Received: Feb. 25, 2014
Accepted: --
Published Online: Jul. 8, 2014
The Author Email: Jun Wang (wjciomp@gmail.com)
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