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Acta Optica Sinica, Volume. 34, Issue 8, 811002(2014)

Foundation and Application of Model for Multilayers Analysis in Extreme Ultra-Violet Lithography Projection

Wang Jun1,2、*, Jin Chunshui1, Wang Liping1, Guo Benyin1, and Yu Bo1
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  • 1[in Chinese]
  • 2[in Chinese]
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    Article index updated: Mar. 10, 2025

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    Wang Jun, Jin Chunshui, Wang Liping, Guo Benyin, Yu Bo. Foundation and Application of Model for Multilayers Analysis in Extreme Ultra-Violet Lithography Projection[J]. Acta Optica Sinica, 2014, 34(8): 811002

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    Paper Information

    Category: Imaging Systems

    Received: Feb. 25, 2014

    Accepted: --

    Published Online: Jul. 8, 2014

    The Author Email: Jun Wang (wjciomp@gmail.com)

    DOI:10.3788/aos201434.0811002

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology