Research progress on infrared laser driven extreme ultraviolet lithography source

LYU Tianhao; SONG Yanjie; ZONG Nan; ZHANG Shenjin; BO Yong; PENG Qinjun

doi:10.7510/jgjs.issn.1001-3806.2025.03.003

Laser Technology, Volume. 49, Issue 3, 328(2025)

Research progress on infrared laser driven extreme ultraviolet lithography source

LYU Tianhao^1,2, SONG Yanjie^1,3, ZONG Nan^1,3,4、*, ZHANG Shenjin^1,3,4, BO Yong^1,3,4, and PENG Qinjun^1,3,4

¹Key Laboratory of Solid State Laser, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China

²University of Chinese Academy of Sciences, Beijing 100149, China

³Key Laboratory of Functional Crystals and Laser Technology, Technical Institute of Physics and Chemistry, Chinese Academy of Sciences, Beijing 100190, China

⁴Institute of Optical Physics and Engineering Technology, Qilu Zhongke, Ji'nan 250000, China

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LYU Tianhao, SONG Yanjie, ZONG Nan, ZHANG Shenjin, BO Yong, PENG Qinjun. Research progress on infrared laser driven extreme ultraviolet lithography source[J]. Laser Technology, 2025, 49(3): 328

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Paper Information

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Received: Jun. 12, 2024

Accepted: Jul. 11, 2025

Published Online: Jul. 11, 2025

The Author Email: ZONG Nan (zongnan@mail.ipc.ac)

DOI:10.7510/jgjs.issn.1001-3806.2025.03.003

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology