Infrared and Laser Engineering, Volume. 50, Issue 11, 20210083(2021)
Design of 1 280×1 024 vertical antiblooming EMCCD
Fig. 2. 1280 × 1024 EMCCD structure design. (a) 1280 × 1024 EMCCD device structure; (b) Simplified pixel structure with antiblooming function; (c) Pixel two-dimensional model
Fig. 5. Designed 1280×1024 EMCCD. (a) Scanning electron microscope of pixel; (b) Packaged device
Fig. 6. Antiblooming factor curve of EMCCD as a function of substrate voltage
Fig. 8. Imaging effect of EMCCD antiblooming. (a)-(h) Antiblooming off; (i)-(l) Antiblooming on
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Yuanjin Chen, Weijing Chang, Qingfei Liu, Fang Dai, Lingxue Wang. Design of 1 280×1 024 vertical antiblooming EMCCD[J]. Infrared and Laser Engineering, 2021, 50(11): 20210083
Category: Optical design
Received: Feb. 1, 2021
Accepted: --
Published Online: Dec. 7, 2021
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